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Influence of Substrate Bias Voltage on the Physical, Electrical and Dielectric Properties of Rf Magnetron Sputtered Tio 2 Films

AuthID
P-008-2Z3

Author(s)

Kondaiah, P

Sekhar, MC

Chandra, SVJ

Martins, R

Uthanna, S

Elangovan, E

Document Type

Proceedings Paper

Year published

2012

Published

in IOP Conference Series: Materials Science and Engineering, ISSN: 1757-8981

Volume: 30, Issue: 1, Pages: 012005

Conference

European Materials Research Society (Emrs) Fall Meeting 2011 Symposium K: Solution-Derived Electronic-Oxide Films Nanostructures and Patterning, from Materials to Devices, Date: 19 September 2011 through 23 September 2011, Location: Warsaw

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Publication Identifiers

DOI: 10.1088/1757-899x/30/1/012005

SCOPUS: 2-s2.0-84858213569

Source Identifiers

ISSN: 1757-8981

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Influence of Substrate Bias Voltage on the Physical, Electrical and Dielectric Properties of Rf Magnetron Sputtered Tio 2 Films

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