Process Monitoring During Alnxoy Deposition by Reactive Magnetron Sputtering and Correlation with the Film's Properties

AuthID
 P-009-5EZ
4
Author(s)
Document Type
Article
Year published
2014
Published
in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, ISSN: 0734-2101
Volume: 32, Issue: 2, Pages: 021307 (10)
Indexing
Wos®
Scopus®
Crossref®
Google Scholar®
Publication Identifiers
SCOPUS: 2-s2.0-84894024580
Wos: WOS:000335964200039
Source Identifiers
ISSN: 0734-2101
Export Publication Metadata
Marked List
 Add to Marked List
Info
At this moment we don't have any links to full text documens.

A place for researchers and their institutions

Useful Links

Get Help

© 2024 CRACS & Inesc TEC - All Rights Reserved Privacy Policy | Terms of Service