Anomalous C-V Response Correlated to Relaxation Processes in Tio2 Thin Film Based-Metal-Insulator-Metal Capacitor: Effect of Titanium and Oxygen Defects

AuthID
 P-00A-C4Y
4
Author(s)
Kahouli, A
·
Sylvestre, A
·
Document Type
Article
Year published
2015
Published
in JOURNAL OF APPLIED PHYSICS, ISSN: 0021-8979
Volume: 117, Issue: 15, Pages: 154101 (6)
Indexing
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Scopus®
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Google Scholar®
Publication Identifiers
SCOPUS: 2-s2.0-84928157282
Wos: WOS:000353306900016
Source Identifiers
ISSN: 0021-8979
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