The Influence of the Growth Rate on the Preferred Orientation of Magnetron-Sputtered Ti-Al-N Thin Films Studied by in Situ X-Ray Diffraction

AuthID
 P-00F-RGR
5
Author(s)
Beckers, M
·
Mucklich, A
·
Moller, W
Document Type
Article
Year published
2005
Published
in JOURNAL OF APPLIED PHYSICS, ISSN: 0021-8979
Volume: 98, Issue: 4, Pages: 044901 (7)
Indexing
Wos®
Scopus®
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Google Scholar®
Publication Identifiers
SCOPUS: 2-s2.0-25144502840
Wos: WOS:000231551700110
Source Identifiers
ISSN: 0021-8979
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