High Rate Sputtering Deposition of Silicon Oxide Thin Films from New Si O 2:Si Target Composition

AuthID
 P-00F-VW8
3
Author(s)
Stevenson, D
Document Type
Article
Year published
2009
Published
in Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, ISSN: 0734-2101
Volume: 27, Issue: 4, Pages: 979-985
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Scopus®
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Publication Identifiers
Scopus: 2-s2.0-67650330578
Source Identifiers
ISSN: 0734-2101
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