Annealing Kinetics of A-Si:h Deposited by Concentric-Electrode Rf Glow Discharge at Room Temperature

AuthID
 P-00H-MCE
8
Author(s)
Chan, KK
·
Blum, JM
·
Arienzo, M
·
Monteiro, PA
·
Wyrsh, N
Document Type
Article
Year published
1993
Published
in J. Appl. Phys. - Journal of Applied Physics, ISSN: 0021-8979
Volume: 73, Issue: 4, Pages: 1826
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ISSN: 0021-8979
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