A Comparative Analysis Between Genetic Algorithms and Complex Nonlinear Least Squares on Electrical Impedance Characterization

AuthID
 P-00K-WW7
2
Author(s)
Document Type
Proceedings Paper
Year published
2016
Published
in 2016 IEEE INTERNATIONAL INSTRUMENTATION AND MEASUREMENT TECHNOLOGY CONFERENCE PROCEEDINGS
Pages: 1267-1272 (6)
Conference
Ieee International Instrumentation and Measurement Technology Conference (I2Mtc), Date: MAY 23-26, 2016, Location: Taipei, TAIWAN, Sponsors: IEEE, IEEE Instrumentat & Measurement Soc, NAR Labs, Instrumetn Technol Res Ctr, TRIOPTICS Taiwan, HsintekOptics, BASO Precis Opt Ltd, Ind Technol Res Inst, YINSH, T & U, Lumos Technol Co Ltd, Zimmerman Sci Co Ltd, CMOS Sensor Inc, arn, Keysight Technologies, Zurich Instrumetns, Samwell Testing Inc
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Wos: WOS:000382523600224
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