Publications

Optimizing Stressor Film Deposition Sequence in Polish Rate Order for Best Planarization

AuthID
P-00N-QTJ

Author(s)

Zhang, JH

Xiao, C

Strane, JW

Venigalla, R

Economikos, L

Hall, L

Chen, J

Stoll, DC

Wallner, J

Zhuang, H

Ferreira, P

Kleemeier, W

Goldberg, C

Moon, Y

Truong, C

Sudijono, J

Chen, X

Sampson, R

Document Type

Proceedings Paper

Year published

2012

Published

in Materials Research Society Symposium Proceedings, ISSN: 0272-9172

Volume: 1335, Pages: 35-40

Conference

2011 Mrs Spring Meeting, Date: 25 April 2011 through 29 April 2011, Location: San Francisco, CA

Indexing

Scopus^®

Crossref^®

Google Scholar^®

Metadata
Sources

Publication Identifiers

DOI: 10.1557/opl.2011.854

Scopus: 2-s2.0-84055193773

Source Identifiers

ISSN: 0272-9172

Export Publication Metadata

Marked List

Add to Marked List

Info

At this moment we don't have any links to full text documens.

Optimizing Stressor Film Deposition Sequence in Polish Rate Order for Best Planarization

Useful Links

Get Help

Federated Authentication (Click on the image)

Optimizing Stressor Film Deposition Sequence in Polish Rate Order for Best Planarization

Useful Links

Get Help