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Optimizing Stressor Film Deposition Sequence in Polish Rate Order for Best Planarization

AuthID
P-00N-QTJ

Author(s)

Zhang, JH

Xiao, C

Strane, JW

Venigalla, R

Economikos, L

Hall, L

Chen, J

Stoll, DC

Wallner, J

Zhuang, H

Ferreira, P

Kleemeier, W

Goldberg, C

Moon, Y

Truong, C

Sudijono, J

Chen, X

Sampson, R

Document Type

Proceedings Paper

Year published

2012

Published

in Materials Research Society Symposium Proceedings, ISSN: 0272-9172

Volume: 1335, Pages: 35-40

Conference

2011 Mrs Spring Meeting, Date: 25 April 2011 through 29 April 2011, Location: San Francisco, CA

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Metadata
Sources

Publication Identifiers

DOI: 10.1557/opl.2011.854

SCOPUS: 2-s2.0-84055193773

Source Identifiers

ISSN: 0272-9172

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Optimizing Stressor Film Deposition Sequence in Polish Rate Order for Best Planarization

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