Assessing Tolerances in Direct Write Laser Grayscale Lithography and Reactive Ion Etching Pattern Transfer for Fabrication of 2.5D Si Master Molds

AuthID
 P-00Y-AMD
10
Author(s)
Cunha, J
·
Garcia, IS
·
Fernandes, J
·
Gonzalez-Losada, P
·
Silva, C
·
Gaspar, J
·
Document Type
Article
Year published
2023
Published
in MICRO AND NANO ENGINEERING, ISSN: 2590-0072
Volume: 19
Indexing
Wos®
Scopus®
Google Scholar®
Publication Identifiers
SCOPUS: 2-s2.0-85152599142
Wos: WOS:001043852000001
Source Identifiers
ISSN: 2590-0072
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