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Influence of Nitrogen Flow Rate on the Structure and Hardness of Ti-Si-N-O Thin Films Produced by Reactive Sputtering

AuthID
P-011-95Y

Author(s)

García-Gonzalez L.

Garnica-Romo M.G.

Hernández-Torres J.

Martínez-Castillo J.

García-Ramírez P.J.

Ángel-Sauceda A.

Herrera-May A.L.

Espinoza-Beltrán F.J.

Document Type

Proceedings Paper

Year published

2006

Published

in XXII Interamerican Congress of Chemical Engineering, CIIQ 2006 and V Argentinian Congress of Chemical Engineering, CAIQ 2006 - Innovation and Management for Sustainable Development

Pages: 618

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Scopus^®

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Publication Identifiers

SCOPUS: 2-s2.0-84992371901

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Influence of Nitrogen Flow Rate on the Structure and Hardness of Ti-Si-N-O Thin Films Produced by Reactive Sputtering

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Influence of Nitrogen Flow Rate on the Structure and Hardness of Ti-Si-N-O Thin Films Produced by Reactive Sputtering

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