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Fermi-Level Pinning at the Polysilicon Metal Oxide Interface - Part Ii

AuthID
P-014-YYP

Author(s)

Hobbs, CC

Fonseca, LRC

Knizhnik, A

Dhandapani, V

Samavedam, SB

Taylor, WJ

Grant, JM

Dip, LG

Triyoso, DH

Hegde, RI

Gilmer, DC

Garcia, R

Roan, D

Lovejoy, ML

Rai, RS

Hebert, EA

Tseng, HH

Anderson, SGH

White, BE

Tobin, PJ

Document Type

Article

Year published

2004

Published

in IEEE TRANSACTIONS ON ELECTRON DEVICES, ISSN: 0018-9383

Volume: 51, Issue: 6, Pages: 978-984 (7)

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Publication Identifiers

DOI: 10.1109/ted.2004.829510

Wos: WOS:000221660100022

Source Identifiers

ISSN: 0018-9383

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Fermi-Level Pinning at the Polysilicon Metal Oxide Interface - Part Ii

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Fermi-Level Pinning at the Polysilicon Metal Oxide Interface - Part Ii

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