Rodrigo Ferrao Paiva Martins
AuthID: R-000-FKV
391
TITLE: Influence of the process parameters on structural and electrical properties of r.f. magnetron sputtering ITO films Full Text
AUTHORS: Baía, I; Fernandes, B; Nunes, P; Quintela, M; Martins, R;
PUBLISHED: 2001, SOURCE: Thin Solid Films, VOLUME: 383, ISSUE: 1-2
AUTHORS: Baía, I; Fernandes, B; Nunes, P; Quintela, M; Martins, R;
PUBLISHED: 2001, SOURCE: Thin Solid Films, VOLUME: 383, ISSUE: 1-2
392
TITLE: Role of ion bombardment on the properties of a-Si:H films Full Text
AUTHORS: Hugo Águas; Martins, R; Fortunato, E;
PUBLISHED: 2001, SOURCE: Vacuum, VOLUME: 60, ISSUE: 1-2
AUTHORS: Hugo Águas; Martins, R; Fortunato, E;
PUBLISHED: 2001, SOURCE: Vacuum, VOLUME: 60, ISSUE: 1-2
393
TITLE: Fast and cheap method to qualitatively measure the thickness and uniformity of ZrO2 thin films Full Text
AUTHORS: Hugo Águas; António Marques; Rodrigo Martins; Elvira Fortunato;
PUBLISHED: 2001, SOURCE: Materials Science in Semiconductor Processing, VOLUME: 4, ISSUE: 1-3
AUTHORS: Hugo Águas; António Marques; Rodrigo Martins; Elvira Fortunato;
PUBLISHED: 2001, SOURCE: Materials Science in Semiconductor Processing, VOLUME: 4, ISSUE: 1-3
394
TITLE: Influence of the Plasma Regime on the Structural, Optical, Electrical and Morphological Properties of a-Si:H Thin Films
AUTHORS: Hugo Águas; Rodrigo Martins; Yuri Nunes ; Manuel J.P Maneira; Elvira Fortunato;
PUBLISHED: 2001, SOURCE: Materials Science Forum, VOLUME: 382
AUTHORS: Hugo Águas; Rodrigo Martins; Yuri Nunes ; Manuel J.P Maneira; Elvira Fortunato;
PUBLISHED: 2001, SOURCE: Materials Science Forum, VOLUME: 382
395
TITLE: Silicon films produced by PECVD under powder formation conditions
AUTHORS: Martins, R; Aguas, H ; Silva, V; Ferreira, I; Cabrita, A; Fortunato, E ;
PUBLISHED: 2000, SOURCE: 5th European Workshop on Dusty and Collidal Plasmas in PLASMA PROCESSING AND DUSTY PARTICLES, VOLUME: 382
AUTHORS: Martins, R; Aguas, H ; Silva, V; Ferreira, I; Cabrita, A; Fortunato, E ;
PUBLISHED: 2000, SOURCE: 5th European Workshop on Dusty and Collidal Plasmas in PLASMA PROCESSING AND DUSTY PARTICLES, VOLUME: 382
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ResearcherID396
TITLE: Plasma diagnostics of a PECVD system using different R.F. electrode configurations Full Text
AUTHORS: Águas, H; Martins, R; Fortunato, E;
PUBLISHED: 2000, SOURCE: Vacuum, VOLUME: 56, ISSUE: 1
AUTHORS: Águas, H; Martins, R; Fortunato, E;
PUBLISHED: 2000, SOURCE: Vacuum, VOLUME: 56, ISSUE: 1
397
TITLE: Study of the effect of different plasma-enhanced chemical vapour deposition reactor configurations on the properties of hydrogenated amorphous silicon thin films Full Text
AUTHORS: águas H.; Silva V.; Ferreira I.; Fortunato E.; Martins R.;
PUBLISHED: 2000, SOURCE: Philosophical Magazine B: Physics of Condensed Matter; Statistical Mechanics, Electronic, Optical and Magnetic Properties, VOLUME: 80, ISSUE: 4
AUTHORS: águas H.; Silva V.; Ferreira I.; Fortunato E.; Martins R.;
PUBLISHED: 2000, SOURCE: Philosophical Magazine B: Physics of Condensed Matter; Statistical Mechanics, Electronic, Optical and Magnetic Properties, VOLUME: 80, ISSUE: 4
398
TITLE: Performances exhibited by large area ITO layers produced by r.f. magnetron sputtering Full Text
AUTHORS: Baı́a, I; Quintela, M; Mendes, L; Nunes, P; Martins, R;
PUBLISHED: 1999, SOURCE: Thin Solid Films, VOLUME: 337, ISSUE: 1-2
AUTHORS: Baı́a, I; Quintela, M; Mendes, L; Nunes, P; Martins, R;
PUBLISHED: 1999, SOURCE: Thin Solid Films, VOLUME: 337, ISSUE: 1-2
399
TITLE: New metallurgical systems for electronic soldering applications Full Text
AUTHORS: Gonçalves, C; Ferreira, J; Fortunato, E; Ferreira, I; Martins, R; A.P Marvão; J.I Martins; Harder, T; Oppelt, R;
PUBLISHED: 1999, SOURCE: Sensors and Actuators A: Physical, VOLUME: 74, ISSUE: 1-3
AUTHORS: Gonçalves, C; Ferreira, J; Fortunato, E; Ferreira, I; Martins, R; A.P Marvão; J.I Martins; Harder, T; Oppelt, R;
PUBLISHED: 1999, SOURCE: Sensors and Actuators A: Physical, VOLUME: 74, ISSUE: 1-3
400
TITLE: Role of the collecting resistive layer on the static characteristics of 2D a-Si : H thin film position sensitive detector
AUTHORS: Fortunato, E; Martins, R;
PUBLISHED: 1998, SOURCE: Symposium on Amorphous and Microcrystalline Silicon Technology-1998, at the MRS Spring Meeting in AMORPHOUS AND MICROCRYSTALLINE SILICON TECHNOLOGY-1998, VOLUME: 507
AUTHORS: Fortunato, E; Martins, R;
PUBLISHED: 1998, SOURCE: Symposium on Amorphous and Microcrystalline Silicon Technology-1998, at the MRS Spring Meeting in AMORPHOUS AND MICROCRYSTALLINE SILICON TECHNOLOGY-1998, VOLUME: 507
INDEXED IN: WOS
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