Rodrigo Ferrao Paiva Martins
AuthID: R-000-FKV
391
TITLE: Materials Science Forum: Preface
AUTHORS: Martins, R;
PUBLISHED: 2001, SOURCE: 4th European Workshop on Dusty and Colloidal Plasmas in Materials Science Forum, VOLUME: 382
AUTHORS: Martins, R;
PUBLISHED: 2001, SOURCE: 4th European Workshop on Dusty and Colloidal Plasmas in Materials Science Forum, VOLUME: 382
INDEXED IN: 
Scopus
Scopus IN MY: 
ORCID
ORCID392
TITLE: Thin film metal oxide semiconductors deposited on polymeric substrates
AUTHORS: Fortunato, E; Nunes, P; Marques, A; Costa, D; Aguas, H; Ferreira, I; Costa, MEV; Martins, R;
PUBLISHED: 2001, SOURCE: Transport and Microstructural Phenomena in Oxide Electronics in Materials Research Society Symposium - Proceedings, VOLUME: 666
AUTHORS: Fortunato, E; Nunes, P; Marques, A; Costa, D; Aguas, H; Ferreira, I; Costa, MEV; Martins, R;
PUBLISHED: 2001, SOURCE: Transport and Microstructural Phenomena in Oxide Electronics in Materials Research Society Symposium - Proceedings, VOLUME: 666
INDEXED IN: Scopus
Scopus IN MY: ORCID
ORCID393
TITLE: New Steps to Improve a-Si:H Device Stability by Design of the Interfaces Full Text
AUTHORS: Martins, R; Ferreira, I; Cabrita, A; Águas, H; Silva, V; Fortunato, E;
PUBLISHED: 2001, SOURCE: Advanced Engineering Materials - Adv. Eng. Mater., VOLUME: 3, ISSUE: 3
AUTHORS: Martins, R; Ferreira, I; Cabrita, A; Águas, H; Silva, V; Fortunato, E;
PUBLISHED: 2001, SOURCE: Advanced Engineering Materials - Adv. Eng. Mater., VOLUME: 3, ISSUE: 3
INDEXED IN: 
CrossRef
CrossRef394
TITLE: Influence of the process parameters on structural and electrical properties of r.f. magnetron sputtering ITO films Full Text
AUTHORS: Baía, I; Fernandes, B; Nunes, P; Quintela, M; Martins, R;
PUBLISHED: 2001, SOURCE: Thin Solid Films, VOLUME: 383, ISSUE: 1-2
AUTHORS: Baía, I; Fernandes, B; Nunes, P; Quintela, M; Martins, R;
PUBLISHED: 2001, SOURCE: Thin Solid Films, VOLUME: 383, ISSUE: 1-2
395
TITLE: Role of ion bombardment on the properties of a-Si:H films Full Text
AUTHORS: Hugo Águas; Martins, R; Fortunato, E;
PUBLISHED: 2001, SOURCE: Vacuum, VOLUME: 60, ISSUE: 1-2
AUTHORS: Hugo Águas; Martins, R; Fortunato, E;
PUBLISHED: 2001, SOURCE: Vacuum, VOLUME: 60, ISSUE: 1-2
396
TITLE: Fast and cheap method to qualitatively measure the thickness and uniformity of ZrO2 thin films Full Text
AUTHORS: Hugo Águas; António Marques; Rodrigo Martins; Elvira Fortunato;
PUBLISHED: 2001, SOURCE: Materials Science in Semiconductor Processing, VOLUME: 4, ISSUE: 1-3
AUTHORS: Hugo Águas; António Marques; Rodrigo Martins; Elvira Fortunato;
PUBLISHED: 2001, SOURCE: Materials Science in Semiconductor Processing, VOLUME: 4, ISSUE: 1-3
397
TITLE: Influence of the Plasma Regime on the Structural, Optical, Electrical and Morphological Properties of a-Si:H Thin Films
AUTHORS: Hugo Águas; Rodrigo Martins; Yuri Nunes ; Manuel J.P Maneira; Elvira Fortunato;
PUBLISHED: 2001, SOURCE: Materials Science Forum, VOLUME: 382
AUTHORS: Hugo Águas; Rodrigo Martins; Yuri Nunes ; Manuel J.P Maneira; Elvira Fortunato;
PUBLISHED: 2001, SOURCE: Materials Science Forum, VOLUME: 382
398
TITLE: Silicon films produced by PECVD under powder formation conditions
AUTHORS: Martins, R; Aguas, H ; Silva, V; Ferreira, I; Cabrita, A; Fortunato, E ;
PUBLISHED: 2000, SOURCE: 5th European Workshop on Dusty and Collidal Plasmas in PLASMA PROCESSING AND DUSTY PARTICLES, VOLUME: 382
AUTHORS: Martins, R; Aguas, H ; Silva, V; Ferreira, I; Cabrita, A; Fortunato, E ;
PUBLISHED: 2000, SOURCE: 5th European Workshop on Dusty and Collidal Plasmas in PLASMA PROCESSING AND DUSTY PARTICLES, VOLUME: 382
INDEXED IN: 
WOS
WOS IN MY: ResearcherID
ResearcherID399
TITLE: Plasma diagnostics of a PECVD system using different R.F. electrode configurations Full Text
AUTHORS: Águas, H; Martins, R; Fortunato, E;
PUBLISHED: 2000, SOURCE: Vacuum, VOLUME: 56, ISSUE: 1
AUTHORS: Águas, H; Martins, R; Fortunato, E;
PUBLISHED: 2000, SOURCE: Vacuum, VOLUME: 56, ISSUE: 1
400
TITLE: Study of the effect of different plasma-enhanced chemical vapour deposition reactor configurations on the properties of hydrogenated amorphous silicon thin films Full Text
AUTHORS: águas H.; Silva V.; Ferreira I.; Fortunato E.; Martins R.;
PUBLISHED: 2000, SOURCE: Philosophical Magazine B: Physics of Condensed Matter; Statistical Mechanics, Electronic, Optical and Magnetic Properties, VOLUME: 80, ISSUE: 4
AUTHORS: águas H.; Silva V.; Ferreira I.; Fortunato E.; Martins R.;
PUBLISHED: 2000, SOURCE: Philosophical Magazine B: Physics of Condensed Matter; Statistical Mechanics, Electronic, Optical and Magnetic Properties, VOLUME: 80, ISSUE: 4
