S. Nitsche
AuthID: R-006-PG6
1
TITLE: Epitaxial growth of β-FeSi2 on silicon (111): a real-time RHEED analysis Full Text
AUTHORS: Chevrier, J; Le Thanh, V; Nitsche, S; Derrien, J;
PUBLISHED: 1992, SOURCE: Applied Surface Science, VOLUME: 56-58, ISSUE: PART 1
AUTHORS: Chevrier, J; Le Thanh, V; Nitsche, S; Derrien, J;
PUBLISHED: 1992, SOURCE: Applied Surface Science, VOLUME: 56-58, ISSUE: PART 1
INDEXED IN: Scopus