S. Uthanna
AuthID: R-006-QTQ
1
TITLE: Investigations on Compositional, Structural and Optical Properties of Thermally Oxidized HfO2 Films
AUTHORS: Venkataiah, S; Chandra, SVJ; Babu, MV; Uthanna, S;
PUBLISHED: 2021, SOURCE: ARABIAN JOURNAL FOR SCIENCE AND ENGINEERING
AUTHORS: Venkataiah, S; Chandra, SVJ; Babu, MV; Uthanna, S;
PUBLISHED: 2021, SOURCE: ARABIAN JOURNAL FOR SCIENCE AND ENGINEERING
INDEXED IN: Scopus WOS
2
TITLE: Post-deposition annealing influenced structural and electrical properties of Al/TiO2/Si gate capacitors Full Text
AUTHORS: Chandra C Sekhar; Kondaiah, P; Mohan M Rao; Jagadeesh V J Chandra; Uthanna, S;
PUBLISHED: 2013, SOURCE: SUPERLATTICES AND MICROSTRUCTURES, VOLUME: 62
AUTHORS: Chandra C Sekhar; Kondaiah, P; Mohan M Rao; Jagadeesh V J Chandra; Uthanna, S;
PUBLISHED: 2013, SOURCE: SUPERLATTICES AND MICROSTRUCTURES, VOLUME: 62
3
TITLE: Substrate temperature influenced physical properties of silicon MOS devices with TiO2 gate dielectric. Physical properties of Silicon MOS devices with TiO2 gate dielectric Full Text
AUTHORS: Chandra C Sekhar; Kondaiah, P; Jagadeesh Chandra, SVJ; Mohan M Rao; Uthanna, S;
PUBLISHED: 2012, SOURCE: SURFACE AND INTERFACE ANALYSIS, VOLUME: 44, ISSUE: 9
AUTHORS: Chandra C Sekhar; Kondaiah, P; Jagadeesh Chandra, SVJ; Mohan M Rao; Uthanna, S;
PUBLISHED: 2012, SOURCE: SURFACE AND INTERFACE ANALYSIS, VOLUME: 44, ISSUE: 9
4
TITLE: The effect of Substrate temperature on physical and electrical properties of DC magnetron sputtered (Ta2O5)(0.85)(TiO2)(0.15) films Full Text
AUTHORS: Chandra C Sekhar; Uthanna, S; Martins, R ; Jagadeesh Chandra, SVJ; Elangovan, E;
PUBLISHED: 2012, SOURCE: Symposium I on Advances in Transparent Electronics, from Materials to Devices III/Fall Meeting of the European-Materials-Research-Society (E-MRS) in E-MRS 2011 FALL SYMPOSIUM I: ADVANCES IN TRANSPARENT ELECTRONICS, FROM MATERIALS TO DEVICES III, VOLUME: 34, ISSUE: 1
AUTHORS: Chandra C Sekhar; Uthanna, S; Martins, R ; Jagadeesh Chandra, SVJ; Elangovan, E;
PUBLISHED: 2012, SOURCE: Symposium I on Advances in Transparent Electronics, from Materials to Devices III/Fall Meeting of the European-Materials-Research-Society (E-MRS) in E-MRS 2011 FALL SYMPOSIUM I: ADVANCES IN TRANSPARENT ELECTRONICS, FROM MATERIALS TO DEVICES III, VOLUME: 34, ISSUE: 1
5
TITLE: Substrate Temperature Influenced Structural and Electrical Behaviour of RF Magnetron Sputtered Ag2Cu2O3 Films Full Text
AUTHORS: Sreedhar, A; Hari Prasad P Reddy; Uthanna, S; Martins, R ; Elangovan, E; Pierson, JF;
PUBLISHED: 2011, SOURCE: Fall Meeting of the European-Materials-Research-Society (E-MRS)/Symposium H - Novel Materials for Electronics, Optoelectronics, Photovoltaics and Energy Saving Applications in ACTA PHYSICA POLONICA A, VOLUME: 120, ISSUE: 6A
AUTHORS: Sreedhar, A; Hari Prasad P Reddy; Uthanna, S; Martins, R ; Elangovan, E; Pierson, JF;
PUBLISHED: 2011, SOURCE: Fall Meeting of the European-Materials-Research-Society (E-MRS)/Symposium H - Novel Materials for Electronics, Optoelectronics, Photovoltaics and Energy Saving Applications in ACTA PHYSICA POLONICA A, VOLUME: 120, ISSUE: 6A
INDEXED IN: WOS
6
TITLE: Influence of substrate and selenization temperatures on the growth of Cu2SnSe3 films Full Text
AUTHORS: Hema H Chandra; Lakshmana L Kumar; Prasada P Rao; Uthanna, S;
PUBLISHED: 2011, SOURCE: JOURNAL OF MATERIALS SCIENCE, VOLUME: 46, ISSUE: 21
AUTHORS: Hema H Chandra; Lakshmana L Kumar; Prasada P Rao; Uthanna, S;
PUBLISHED: 2011, SOURCE: JOURNAL OF MATERIALS SCIENCE, VOLUME: 46, ISSUE: 21
7
TITLE: Growth of highly (111) oriented Culn(0.75)Al(0.25)Se(2) thin films Full Text
AUTHORS: Hema H Chandra; Udayakumar, C; Padhy, N; Uthanna, S;
PUBLISHED: 2010, SOURCE: MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, VOLUME: 13, ISSUE: 4
AUTHORS: Hema H Chandra; Udayakumar, C; Padhy, N; Uthanna, S;
PUBLISHED: 2010, SOURCE: MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, VOLUME: 13, ISSUE: 4
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TITLE: Electrical and optical properties of In2O3:Mo thin films prepared at various Mo-doping levels Full Text
AUTHORS: Kaleemulla, S; Madhusudhana M Rao; Girish G Joshi; Sivasankar S Reddy; Uthanna, S; Sreedhara S Reddy;
PUBLISHED: 2010, SOURCE: JOURNAL OF ALLOYS AND COMPOUNDS, VOLUME: 504, ISSUE: 2
AUTHORS: Kaleemulla, S; Madhusudhana M Rao; Girish G Joshi; Sivasankar S Reddy; Uthanna, S; Sreedhara S Reddy;
PUBLISHED: 2010, SOURCE: JOURNAL OF ALLOYS AND COMPOUNDS, VOLUME: 504, ISSUE: 2
9
TITLE: Physical properties of In2O3 thin films prepared at various oxygen partial pressures Full Text
AUTHORS: Kaleemulla, S; Sivasankar S Reddy; Uthanna, S; Sreedhara S Reddy;
PUBLISHED: 2009, SOURCE: JOURNAL OF ALLOYS AND COMPOUNDS, VOLUME: 479, ISSUE: 1-2
AUTHORS: Kaleemulla, S; Sivasankar S Reddy; Uthanna, S; Sreedhara S Reddy;
PUBLISHED: 2009, SOURCE: JOURNAL OF ALLOYS AND COMPOUNDS, VOLUME: 479, ISSUE: 1-2