Chandra C. Sekhar
AuthID: R-00G-HB8
1
TITLE: Post-deposition annealing influenced structural and electrical properties of Al/TiO2/Si gate capacitors Full Text
AUTHORS: Chandra C Sekhar; Kondaiah, P; Mohan M Rao; Jagadeesh V J Chandra; Uthanna, S;
PUBLISHED: 2013, SOURCE: SUPERLATTICES AND MICROSTRUCTURES, VOLUME: 62
AUTHORS: Chandra C Sekhar; Kondaiah, P; Mohan M Rao; Jagadeesh V J Chandra; Uthanna, S;
PUBLISHED: 2013, SOURCE: SUPERLATTICES AND MICROSTRUCTURES, VOLUME: 62
