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TITLE: Post-deposition annealing influenced structural and electrical properties of Al/TiO2/Si gate capacitors  Full Text
AUTHORS: Chandra C Sekhar; Kondaiah, P; Mohan M Rao; Jagadeesh V J Chandra; Uthanna, S;
PUBLISHED: 2013, SOURCE: SUPERLATTICES AND MICROSTRUCTURES, VOLUME: 62
INDEXED IN: Scopus WOS CrossRef