Correlation Between the Carbon and Hydrogen Contents with the Gas Species and the Plasma Impedance of Silicon Carbide Films Produced by Pecvd Technique

AuthID
 P-000-SEK
6
Author(s)
Document Type
Article
Year published
2001
Published
in APPLIED SURFACE SCIENCE, ISSN: 0169-4332
Volume: 184, Issue: 1-4, Pages: 101-106 (6)
Conference
Spring Meeting of the European-Materials-Research-Society, Date: JUN 05-08, 2001, Location: STRASBOURG, FRANCE, Sponsors: European Mat Res Soc
Indexing
Wos®
Scopus®
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Publication Identifiers
SCOPUS: 2-s2.0-0035852198
Wos: WOS:000173000100017
Source Identifiers
ISSN: 0169-4332
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