High Rate Sputtering Deposition of Silicon Oxide Thin Films from New Si O 2:Si Target Composition

AuthID
 P-00F-VW8
3
Author(s)
Stevenson, D
Document Type
Article
Year published
2009
Published
in Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, ISSN: 0734-2101
Volume: 27, Issue: 4, Pages: 979-985
Indexing
Scopus®
Crossref®
Google Scholar®
Publication Identifiers
SCOPUS: 2-s2.0-67650330578
Source Identifiers
ISSN: 0734-2101
Export Publication Metadata
Marked List
 Add to Marked List
Info
At this moment we don't have any links to full text documens.

A place for researchers and their institutions

Useful Links

Get Help

© 2024 CRACS & Inesc TEC - All Rights Reserved Privacy Policy | Terms of Service