ProfileOfResearchers

NO MEU:

402

TÃTULO: Correlation between surface/interface states and the performance of MIS structures
AUTORES: Aguas, HMB ; Fortunato, EMC ; Cabrita, AM; Silva, V; Tonello, PMN; Martins, RFP ;
PUBLICAÇÃO: 2000, FONTE: Amorphous and Heterogeneus Silicon Thin Films-2000 in Materials Research Society Symposium - Proceedings, VOLUME: 609

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Scopus

NO MEU:

403

TÃTULO: Improvement of a-Si : H device stability and performances by proper design of the interfaces Full Text
AUTORES: Martins, R ; Ferreira, I ; Cabrita, A; Fortunato, E ;
PUBLICAÇÃO: 2000, FONTE: 18th International Conference on Amorphous and Microcrystalline Semiconductors (ICAMS 18) in JOURNAL OF NON-CRYSTALLINE SOLIDS, VOLUME: 266

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Scopus

WOS

NO MEU:

ORCID |

404

TÃTULO: Influence of the plasma regime on the structural, optical, electrical and morphological properties of a-Si : H thin films
AUTORES: Aguas, H ; Martins, R ; Nunes, Y ; Maneira, M; Fortunato, E ;
PUBLICAÇÃO: 2000, FONTE: 5th European Workshop on Dusty and Colloidal Plasmas in PLASMA PROCESSING AND DUSTY PARTICLES, VOLUME: 382

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Scopus

WOS

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ORCID |

405

TÃTULO: Large area flexible amorphous silicon position sensitive detectors
AUTORES: Fortunato, EMC ; Brida, D; Ferreira, IMM ; Aguas, HMB ; Nunes, P; Cabrita, A; Giuliani, F; Nunes, Y ; Maneira, MJP; Martins, RFP ;
PUBLICAÇÃO: 2000, FONTE: Amorphous and Heterogeneus Silicon Thin Films-2000 in Materials Research Society Symposium - Proceedings, VOLUME: 609, NÚMERO: 7

INDEXADO EM:

Scopus

NO MEU:

406

TÃTULO: Morphological and structural characteristics presented by the Cu-Sn-Cu metallurgical system used in electronic joints Full Text
AUTORES: Ferreira, J; Fernandes, B; Goncalves, C; Nunes, P; Fortunato, E ; Martins, R ; Martins, JI ; Marvao, AP;
PUBLICAÇÃO: 2000, FONTE: Joint FEMS Symposium/E-MRS Symposium H Strain in Materials: Analysis, Relatation and Properties in MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, VOLUME: 288, NÚMERO: 2

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Scopus

WOS

NO MEU:

ORCID |

407

TÃTULO: N-type silicon films produced by hot wire technique
AUTORES: Ferreira, IMM ; Cabrita, AMF; Fortunato, EMC ; Martins, RFP ;
PUBLICAÇÃO: 2000, FONTE: Amorphous and Heterogeneus Silicon Thin Films-2000 in Materials Research Society Symposium - Proceedings, VOLUME: 609

INDEXADO EM:

Scopus

NO MEU:

408

TÃTULO: Nanocrystalline undoped silicon films produce by hot wire plasma assisted technique
AUTORES: Ferreira, IMM ; Martins, RFP ; Cabrita, AMF; Fortunato, EMC ; Vilarinho, P ;
PUBLICAÇÃO: 2000, FONTE: Amorphous and Heterogeneus Silicon Thin Films-2000 in Materials Research Society Symposium - Proceedings, VOLUME: 609

INDEXADO EM:

Scopus

NO MEU:

409

TÃTULO: New nanostructured silicon films grown by PECVD technique under controlled powder formation conditions Full Text
AUTORES: Martins, R ; Aguas, H ; Cabrita, A; Tonello, P; Silva, V; Ferreira, I ; Fortunato, E ; Guimaraes, L;
PUBLICAÇÃO: 2000, FONTE: SOLAR ENERGY, VOLUME: 69, NÚMERO: 1-6

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Scopus

WOS

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ORCID |

410

TÃTULO: New ultra-light flexible large area thin film position sensitive detector based on amorphous silicon Full Text
AUTORES: Fortunato, E ; Ferreira, I ; Giuliani, F; Wurmsdobler, P; Martins, R ;
PUBLICAÇÃO: 2000, FONTE: 18th International Conference on Amorphous and Microcrystalline Semiconductors (ICAMS 18) in JOURNAL OF NON-CRYSTALLINE SOLIDS, VOLUME: 266

INDEXADO EM:

WOS

NO MEU:

ORCID |