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TÃTULO: Fine Tuning of the Spectral Sensitivity in a-SiC:H Stacked p-i'i-n Graded Cells
AUTORES: Fantoni, A ; Fernandes, M ; Louro, P ; Guilherme Lavareda ; Carlos N Carvalho ; Vieira, M;
PUBLICAÇÃO: 2009, FONTE: MRS Spring Meeting in AMORPHOUS AND POLYCRYSTALLINE THIN FILM SILICON SCIENCE AND TECHNOLOGY - 2009, VOL 1153, VOLUME: 1153

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TÃTULO: Optical Processing Devices for Optical Communications: Multilayered a-SiC:H Architectures
AUTORES: Louro, P ; Vieira, M; Vieira, MA ; Fernandes, M ; Fantoni, A ; Lavareda, G ; Carvalho, CN ;
PUBLICAÇÃO: 2009, FONTE: MRS Spring Meeting in AMORPHOUS AND POLYCRYSTALLINE THIN FILM SILICON SCIENCE AND TECHNOLOGY - 2009, VOL 1153, VOLUME: 1153

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TÃTULO: Pinpi'n and Pinpii'n Multilayer Devices with Voltage Controlled Optical Readout
AUTORES: Vieira, M; Fantoni, A ; Fernandes, M ; Louro, P ; Lavareda, G ; Carvalho, CN ;
PUBLICAÇÃO: 2009, FONTE: 1st International Meeting on Developments in Materials, Processes and Applications of Nanotechnology (MPA 2007) in JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, VOLUME: 9, NÚMERO: 7

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TÃTULO: A MIS transistor using the nucleation surface of polycrystalline diamond Full Text
AUTORES: Madaleno, JC ; Pereira, L ; Lavareda, G ; Cabral, G; Carvalho, N; Amaral, A ; Titus, E ; Coelho, MC ; Gracio, J ;
PUBLICAÇÃO: 2008, FONTE: International Conference on New Diamond and Nano Carbons in DIAMOND AND RELATED MATERIALS, VOLUME: 17, NÚMERO: 4-5

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TÃTULO: Improvement in pinpin Device Architectures for Imaging Applications
AUTORES: Louro, P ; Fantoni, A ; Fernandes, M ; Lavareda, G ; Carvalho, N; Vieira, M ;
PUBLICAÇÃO: 2008, FONTE: Symposium on Amorphous and Polycrystalline Thin-Film Silicon Science and Technology held at the 2008 MRS Spring Meeting in AMORPHOUS AND POLYCRYSTALLINE THIN-FILM SILICON SCIENCE AND TECHNOLOGY-2008, VOLUME: 1066

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TÃTULO: Influence of oxygen partial pressure on the properties of undoped InOx films deposited at room temperature by rf-PERTE Full Text
AUTORES: Nunes de Carvalho, C ; Lavareda, G ; Parreira, P; Valente, J; Amaral, A ; Botelho do Rego, AM ;
PUBLICAÇÃO: 2008, FONTE: Journal of Non-Crystalline Solids, VOLUME: 354, NÚMERO: 15-16

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TÃTULO: Influence of oxygen partial pressure on the properties of undoped InOx films deposited at room temperature by rf-PERTE Full Text
AUTORES: Nunes N de Carvalho ; Lavareda, G ; Parreira, P; Valente, J; Amaral, A ; Botelho do Rego, AMB ;
PUBLICAÇÃO: 2008, FONTE: JOURNAL OF NON-CRYSTALLINE SOLIDS, VOLUME: 354, NÚMERO: 15-16

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TÃTULO: Role of rf power on the properties of undoped SnOx films deposited by rf-PERTE at low substrate temperature Full Text
AUTORES: Valente, J; Lavareda, G ; Conde, O ; Parreira, P; Amaral, A ; Nunes N de Carvalho ;
PUBLICAÇÃO: 2008, FONTE: SURFACE & COATINGS TECHNOLOGY, VOLUME: 202, NÚMERO: 16

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TÃTULO: Role of the oxygen partial pressure on the properties of undoped tin oxide films deposited at low temperature Full Text
AUTORES: Parreira, P; Valente, J; Lavareda, G ; Nunes N de Carvalho; Ramos, AR ; Alves, E ; Brogueira, P ; Amaral, A ;
PUBLICAÇÃO: 2008, FONTE: E-MRS 2007 Spring Meeting Symposium on Advances in Transparent Electronics: From Materials to Devices II in PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, VOLUME: 205, NÚMERO: 8

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