Amorphous Carbon Thin Films: Mechanisms of Hydrogen Incorporation During Magnetron Sputtering and Consequences for the Secondary Electron Emission

AuthID
 P-00Y-QX7
13
Author(s)
Adame, CF
·
Pinto, PC
·
Delaup, Y
·
Neupert, H
·
Himmerlich, M
·
Pfeiffer, S
·
Rimoldi, M
·
Taborelli, M
·
Tipo de Documento
Article
Year published
2023
Publicado
in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, ISSN: 0734-2101
Volume: 41, Número: 4
Indexing
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Publication Identifiers
SCOPUS: 2-s2.0-85163747241
Wos: WOS:001031341000001
Source Identifiers
ISSN: 0734-2101
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