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Effect of the Deposition Rate on Ito Thin Film Properties Prepared by Ion Beam Assisted Deposition (Ibad) Technique

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P-003-5F7

Author(s)

Meng, LJ

Teixeira, V

dos Santos, MP

Tipo de Documento

Article

Year published

2010

Publicado

in PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, ISSN: 1862-6300

Volume: 207, Número: 7, Páginas: 1538-1542 (5)

Conference

Symposium on Advances in Transparent Electronics Held at the 2009 Emrs Spring Meeting, Date: JUN 08-12, 2009, Location: Strasbourg, FRANCE, Patrocinadores: European Mat Res Soc

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Publication Identifiers

DOI: 10.1002/pssa.200983704

SCOPUS: 2-s2.0-77955609144

Wos: WOS:000280719200003

Source Identifiers

ISSN: 1862-6300

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Effect of the Deposition Rate on Ito Thin Film Properties Prepared by Ion Beam Assisted Deposition (Ibad) Technique

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Effect of the Deposition Rate on Ito Thin Film Properties Prepared by Ion Beam Assisted Deposition (Ibad) Technique

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