Nanoimprint Lithography for Grayscale Pattern Replication of Mems Mirrors in a 200 Mm Wafer

AuthID
P-010-1YQ
10
Author(s)
Garcia, IS
·
Retolaza, A
·
Ferreira, C
·
Silva, C
·
Aguiam, DE
·
Alves, FS
·
Dias, RA
·
Cabral, J
·
Gaspar, J
Tipo de Documento
Article
Year published
2024
Publicado
in JOURNAL OF MANUFACTURING PROCESSES, ISSN: 1526-6125
Volume: 116, Páginas: 202-209 (8)
Indexing
Publication Identifiers
SCOPUS: 2-s2.0-85186269836
Wos: WOS:001202888000001
Source Identifiers
ISSN: 1526-6125
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