Growth and Characterisation of Nial and N-Doped Nial Films Deposited by Closed Field Unbalanced Magnetron Sputtering Ion Plating Using Elemental Ni and Al Targets

AuthID
 P-003-7YG
5
Author(s)
Said, R
·
Ahmed, W
·
Abuain, T
·
Abuazza, A
·
Tipo de Documento
Article
Year published
2010
Publicado
in JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, ISSN: 1533-4880
Volume: 10, Número: 4, Páginas: 2600-2605 (6)
Conference
2Nd International Conference on Advanced Nano Materials, Date: 2008, Location: Aveiro, PORTUGAL, Host: Univ Aveiro
Indexing
Wos®
Scopus®
Crossref®
Pubmed®
Google Scholar®
Publication Identifiers
Pubmed: 20355470
SCOPUS: 2-s2.0-77954964518
Wos: WOS:000273984900049
Source Identifiers
ISSN: 1533-4880
Export Publication Metadata
Lista Marked
 Adicionar à lista Marked
Info
At this moment we don't have any links to full text documens.

Um espaço para investigadores e suas Instituições

Links Úteis

Ajuda

© 2024 CRACS & Inesc TEC - All Rights Reserved Política de Privacidade | Terms of Service