On the Rearrangement and Dissociation Mechanism of Sih4+In Its Triply-Degenerate Ground State

AuthID
 P-010-KJG
2
Author(s)
Mondal, T
·
Tipo de Documento
Article
Year published
2024
Publicado
in JOURNAL OF CHEMICAL PHYSICS, ISSN: 0021-9606
Volume: 160, Número: 23
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Publication Identifiers
Pubmed: 38884400
SCOPUS: 2-s2.0-85196364157
Wos: WOS:001254147600010
Source Identifiers
ISSN: 0021-9606
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