Oxygen Diffusion Barrier Applied To High-K Thin Films Deposition

AuthID
P-003-CAR
5
Author(s)
Ducroquet, F
·
Matko, I
·
6
Editor(es)
Kar, S; VanElshocht, S; Misra, D; Houssa, M; Landheer, D; Kita, K
Tipo de Documento
Proceedings Paper
Year published
2010
Publicado
in PHYSICS AND TECHNOLOGY OF HIGH-K MATERIALS 8 in ECS Transactions, ISSN: 1938-5862
Volume: 33, Número: 3, Páginas: 497-506 (10)
Conference
8Th International Symposium on High Dielectric Constant and Other Dielectric Materials for Nanoelectronics and Photonice Held During the 218Th Meeting of the Electrochemical-Society (Ecs), Date: OCT 11-15, 2010, Location: Las Vegas, NV, Patrocinadores: Electrochem Soc (ECS), Dielect Sci & Technol Div, Electrochem Soc (ECS), Elect & Photon Div
Indexing
Publication Identifiers
SCOPUS: 2-s2.0-79551626558
Wos: WOS:000313332400054
Source Identifiers
ISSN: 1938-5862
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