Epr Studies Of Point Defect And Amorphous Phase Production During Ion Implantation In Silicon.

AuthID
 P-013-JNK
4
Author(s)
Goetz G.
·
Karthe W.
·
Schnabel B.
Tipo de Documento
Article
Year published
1979
Publicado
in Radiation effects, ISSN: 00337579
Volume: 42, Número: 1-2, Páginas: 23-28 (5)
Indexing
Scopus®
Google Scholar®
Publication Identifiers
SCOPUS: 2-s2.0-0018548685
Source Identifiers
ISSN: 00337579
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