Creattion of Silicon-Carbon Films by Induction Assisted Plasma Chemical Deposition

AuthID
 P-013-JPQ
12
Author(s)
Temirov, AA
·
Kubasov, IV
·
Turutin, AV
·
Ilina, TS
·
Kislyuk, AM
·
Kiselev, DA
·
Skryleva, EA
·
Salimon, IA
·
Batrameev, NV
·
Malinkovich, MD
·
Parkhomenko, YN
Tipo de Documento
Article
Year published
2023
Publicado
in Izvestiya Vysshikh Uchebnykh Zavedenii. Materialy Elektronnoi Tekhniki = Materials of Electronics Engineering, ISSN: 1609-3577
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Source Identifiers
ISSN: 1609-3577
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