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Deposition of Silicon Nitride Thin Films by Hot-Wire Cvd at 100 Degrees C and 250 Degrees C

AuthID
P-003-KQF

Author(s)

Alpuim, P

Goncalves, LM

Marins, ES

Viseu, TMR

Ferdov, S

Bouree, JE

Tipo de Documento

Article

Year published

2009

Publicado

in THIN SOLID FILMS, ISSN: 0040-6090

Volume: 517, Número: 12, Páginas: 3503-3506 (4)

Conference

5Th International Conference on Hot-Wire Cvd (Cat-Cvd) Process, Date: AUG 20-24, 2008, Location: Cambridge, MA, Host: Massachusetts Inst Technol

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Publication Identifiers

DOI: 10.1016/j.tsf.2009.01.077

SCOPUS: 2-s2.0-64349099566

Wos: WOS:000266296800024

Source Identifiers

ISSN: 0040-6090

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Deposition of Silicon Nitride Thin Films by Hot-Wire Cvd at 100 Degrees C and 250 Degrees C

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