Comparison of the Mechanical and Resonance Properties of Thin Film Silicon Mems Fabricated at 110 and 250 Degrees C

AuthID
 P-003-NHX
3
Author(s)
·
Tipo de Documento
Article
Year published
2009
Publicado
in JOURNAL OF MICROMECHANICS AND MICROENGINEERING, ISSN: 0960-1317
Volume: 19, Número: 2, Páginas: 025018 (6)
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Publication Identifiers
SCOPUS: 2-s2.0-61849089034
Wos: WOS:000262786300019
Source Identifiers
ISSN: 0960-1317
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