Evaluation of Candidate Metals for Dual-Metal Gate Cmos with Hfo2 Gate Dielectric

AuthID
 P-014-YYB
16
Author(s)
Samavedam, SB
·
Schaeffer, JK
·
Gilmer, DC
·
Dhandapani, V
·
Tobin, PJ
·
Mogab, J
·
Nguyen, BY
·
Dakshina Murthy, S
·
Jiang, ZX
·
Martin, R
·
Raymond, MV
·
Zavala, M
·
La, LB
·
Smith, JA
·
Gregory, RB
4
Editor(es)
Veteran,JL;OMeara,DL;Misra,V;Ho,PS
Tipo de Documento
Proceedings Paper
Year published
2002
Publicado
in SILICON MATERIALS-PROCESSING, CHARACTERIZATION AND RELIABILITY, ISSN: 0272-9172
Volume: 716, Páginas: 85-90 (6)
Indexing
Wos®
Publication Identifiers
Wos: WOS:000179334200014
Source Identifiers
ISSN: 0272-9172
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