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Physical and Electrical Properties of Metal Gate Electrodes on Hfo₂ Gate Dielectrics

AuthID
P-014-YYJ

Author(s)

Schaeffer, JK

Samavedam, SB

Gilmer, DC

Dhandapani, V

Tobin, PJ

Mogab, J

Nguyen, BY

White, BE

Dakshina Murthy, S

Rai, RS

Jiang, ZX

Martin, R

Raymond, MV

Zavala, M

La, LB

Smith, JA

Garcia, R

Roan, D

Kottke, M

Gregory, RB

Tipo de Documento

Article

Year published

2003

Publicado

in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, ISSN: 1071-1023

Volume: 21, Número: 1, Páginas: 11-17 (7)

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Fontes

Publication Identifiers

DOI: 10.1116/1.1529650

Wos: WOS:000182603900003

Source Identifiers

ISSN: 1071-1023

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Physical and Electrical Properties of Metal Gate Electrodes on Hfo₂ Gate Dielectrics

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Physical and Electrical Properties of Metal Gate Electrodes on Hfo₂ Gate Dielectrics