Publicações

Effect of Annealing and Electrical Properties of High-Kappa Thin Films Grown by Atomic Layer Deposition Using Carboxylic Acids as Oxygen Source

AuthID
P-003-R4T

Author(s)

Rauwel, E

Ducroquet, F

Rauwel, P

Willinger, MG

Matko, I

Pinna, N

Tipo de Documento

Article

Year published

2009

Publicado

in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, ISSN: 1071-1023

Volume: 27, Número: 1, Páginas: 230-235 (6)

Conference

15Th Workshop on Dielectrics in Microelectronics (Wodim 2008), Date: JUN 23-25, 2008, Location: Bad Saarow, GERMANY, Patrocinadores: Amer Vacuum Soc, German State Brandenburg, Minist Sci, Res & Educ, AIXTRON AG, DCA Instruments Oy, Keithley Instruments, Omicron Nano Technol GmbH, Siltronic AG, SPECS GmbH, STAIB Instrumente GmbH, SUSS MicroTec AG

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