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Sputtering Preparation of Silicon Nitride Thin Films for Gate Dielectric Applications

AuthID
P-000-C1H

Author(s)

Pereira, L

Aguas, H

Igreja, R

Martins, RMS

Nedev, N

Raniero, L

Fortunato, E

Martins, R

Editor(es)

Martins,R;Fortunato,E;Ferreira,I;Dias,C

Tipo de Documento

Article

Year published

2004

Publicado

in ADVANCED MATERIALS FORUM II in Materials Science Forum, ISSN: 0255-5476

Volume: 455-456, Páginas: 69-72 (4)

Conference

2Nd International Materials Symposium, Date: APR 14-16, 2003, Location: Caparica, PORTUGAL, Patrocinadores: Portuguese Mat Soc, Portuguese Sci Fdn, Calouste Gulbenkian Fdn, Luso Amer Fdn, Host: New Univ Lisbon, Fac Sci & Technol

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Fontes

Publication Identifiers

DOI: 10.4028/www.scientific.net/msf.455-456.69

SCOPUS: 2-s2.0-17144442271

Wos: WOS:000222018500014

Source Identifiers

ISSN: 0255-5476

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Sputtering Preparation of Silicon Nitride Thin Films for Gate Dielectric Applications

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