Optimisation of a Home-Made Rie System - Effect of Sf6 Plasma on the Properties of Partially Etched A-Si : H Films

AuthID
 P-000-C1Y
5
Author(s)
4
Editor(es)
Martins, R; Fortunato, E; Ferreira, I; Dias, C
Tipo de Documento
Article
Year published
2004
Publicado
in ADVANCED MATERIALS FORUM II in Materials Science Forum, ISSN: 0255-5476
Volume: 455-456, Páginas: 124-127 (4)
Conference
2Nd International Materials Symposium, Date: APR 14-16, 2003, Location: Caparica, PORTUGAL, Patrocinadores: Portuguese Mat Soc, Portuguese Sci Fdn, Calouste Gulbenkian Fdn, Luso Amer Fdn, Host: New Univ Lisbon, Fac Sci & Technol
Indexing
Wos®
Scopus®
Publication Identifiers
SCOPUS: 2-s2.0-3142687494
Wos: WOS:000222018500027
Source Identifiers
ISSN: 0255-5476
Export Publication Metadata
Lista Marked
 Adicionar à lista Marked
Info
At this moment we don't have any links to full text documens.

Um espaço para investigadores e suas Instituições

Links Úteis

Ajuda

© 2025 CRACS & Inesc TEC - All Rights Reserved Política de Privacidade | Terms of Service