Growth of Polymorphous/Nanocrystalline Silicon Films Deposited by Pecvd at 13.56 Mhz

AuthID
 P-000-C4B
8
Author(s)
Raniero, L
·
Zang, S
·
Boufendi, L
4
Editor(es)
Martins,R;Fortunato,E;Ferreira,I;Dias,C
Tipo de Documento
Article
Year published
2004
Publicado
in ADVANCED MATERIALS FORUM II in MATERIALS SCIENCE FORUM, ISSN: 0255-5476
Volume: 455-456, Páginas: 532-535 (4)
Conference
2Nd International Materials Symposium, Date: APR 14-16, 2003, Location: Caparica, PORTUGAL, Patrocinadores: Portuguese Mat Soc, Portuguese Sci Fdn, Calouste Gulbenkian Fdn, Luso Amer Fdn, Host: New Univ Lisbon, Fac Sci & Technol
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Publication Identifiers
SCOPUS: 2-s2.0-3142691842
Wos: WOS:000222018500115
Source Identifiers
ISSN: 0255-5476
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