Alternative to Classic Annealing Treatments for Fractally Patterned Tio2 Thin Films

AuthID
 P-003-TWX
6
Author(s)
Van Overschelde, O
·
Hamadi, F
·
Hemberg, A
·
Snyders, R
·
Wautelet, M
Tipo de Documento
Article
Year published
2008
Publicado
in JOURNAL OF APPLIED PHYSICS, ISSN: 0021-8979
Volume: 104, Número: 10, Páginas: 103106 (8)
Indexing
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Publication Identifiers
SCOPUS: 2-s2.0-57049159825
Wos: WOS:000262605800006
Source Identifiers
ISSN: 0021-8979
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