Influence of Processing Route and Sio(2) on Sintering Ability, Cte, and Dielectric Constant of Beta-Si(4)Al(2)O(2)N(6)

AuthID
P-003-WM6
6
Author(s)
Ganesh, I
·
Jana, DC
·
Sundararajan, G
·
Tipo de Documento
Article
Year published
2008
Publicado
in JOURNAL OF MATERIALS RESEARCH, ISSN: 0884-2914
Volume: 23, Número: 9, Páginas: 2305-2311 (7)
Indexing
Publication Identifiers
SCOPUS: 2-s2.0-52649106030
Wos: WOS:000259515900003
Source Identifiers
ISSN: 0884-2914
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