Phosphorous and Boron Doping of Nc-Si : H Thin Films Deposited on Plastic Substrates at 150 Degrees C by Hot-Wire Chemical Vapor Deposition

AuthID
 P-004-22B
4
Author(s)
1
Editor(es)
Jean-Eric Bouree
Tipo de Documento
Article
Year published
2008
Publicado
in THIN SOLID FILMS, ISSN: 0040-6090
Volume: 516, Número: 5, Páginas: 576-579 (4)
Conference
4Th International Conference on Hot-Wire Cvd (Cat-Cvd) Process, Date: OCT 04-08, 2006, Location: Takayama, JAPAN
Indexing
Wos®
Scopus®
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Google Scholar®
Publication Identifiers
SCOPUS: 2-s2.0-36749076987
Wos: WOS:000252285900022
Source Identifiers
ISSN: 0040-6090
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