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Carboxylic Acids as Oxygen Supplying Agents for Atomic Layer Deposition of High-Kappa Thin Films

AuthID
P-004-2MN

Author(s)

Rauwel, E

Ducroquet, F

Matko, I

Editor(es)

Londergan, A; Bent, SF; DeGendt, S; Elam, JW; Kang, SB; VanderStraten, O

Tipo de Documento

Proceedings Paper

Year published

2008

Publicado

in ATOMIC LAYER DEPOSITION APPLICATIONS 4 in ECS Transactions, ISSN: 1938-5862

Volume: 16, Número: 4, Páginas: 279-289 (11)

Conference

4Th Symposium on Atomic Layer Deposition Applications Held at the 214Th Meeting of the Electrochemical-Society, Date: OCT 13-15, 2008, Location: Honolulu, HI, Patrocinadores: Electrochem Soc

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Fontes

Publication Identifiers

DOI: 10.1149/1.2980003

SCOPUS: 2-s2.0-63149192783

Wos: WOS:000272018400029

Source Identifiers

ISSN: 1938-5862

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Carboxylic Acids as Oxygen Supplying Agents for Atomic Layer Deposition of High-Kappa Thin Films

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