Growth of Sputter-Deposited Ni-Ti Thin Films: Effect of a Sio2 Buffer Layer

AuthID
 P-004-J02
6
Author(s)
Schell, N
·
Beckers, M
·
Tipo de Documento
Article
Year published
2006
Publicado
in APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, ISSN: 0947-8396
Volume: 84, Número: 3, Páginas: 285-289 (5)
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Publication Identifiers
SCOPUS: 2-s2.0-33745161503
Wos: WOS:000238292600011
Source Identifiers
ISSN: 0947-8396
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