Publicações

Nickel-Assisted Metal-Induced Crystallization of Silicon: Effect of Native Silicon Oxide Layer

AuthID
P-004-JJ6

Author(s)

Pereira, L

Martins, RMS

Schell, N

Fortunato, E

Martins, R

Tipo de Documento

Article

Year published

2006

Publicado

in THIN SOLID FILMS, ISSN: 0040-6090

Volume: 511, Páginas: 275-279 (5)

Conference

Symposium on Thin Film and Nanostructured Materials for Photovoltaics Held at the 2005 Emrs Meeting, Date: MAY 31-JUN 03, 2005, Location: Strasbourg, FRANCE, Patrocinadores: EMRS

Indexing

Wos^®

Scopus^®

Crossref^®

Google Scholar^®

Metadata
Fontes

Publication Identifiers

DOI: 10.1016/j.tsf.2005.12.005

SCOPUS: 2-s2.0-33747381628

Wos: WOS:000238249000055

Source Identifiers

ISSN: 0040-6090

Export Publication Metadata

Lista Marked

Adicionar à lista Marked

Info

At this moment we don't have any links to full text documens.

Nickel-Assisted Metal-Induced Crystallization of Silicon: Effect of Native Silicon Oxide Layer

Links Úteis

Ajuda

Autenticação Federada (Clique na imagem)

Nickel-Assisted Metal-Induced Crystallization of Silicon: Effect of Native Silicon Oxide Layer

Links Úteis

Ajuda