The Influence of a Poly-Si Intermediate Layer on the Crystallization Behaviour of Ni-Tisma Magnetron Sputtered Thin Films

AuthID
 P-004-MB1
9
Author(s)
Beckers, M
·
Mucklich, A
·
Schell, N
Tipo de Documento
Article
Year published
2006
Publicado
in APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, ISSN: 0947-8396
Volume: 83, Número: 1, Páginas: 139-145 (7)
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Publication Identifiers
SCOPUS: 2-s2.0-32244437815
Wos: WOS:000235139500028
Source Identifiers
ISSN: 0947-8396
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