Effect of Processing Conditions on the Microstructure and Electrical Resistance of Nanocrystalline Ito Thin Films Made by Laser Ablation

AuthID
 P-004-NZK
2
Author(s)
1
Editor(es)
Vilarinho, PM
Tipo de Documento
Article
Year published
2006
Publicado
in ADVANCED MATERIALS FORUM III, PTS 1 AND 2 in MATERIALS SCIENCE FORUM, ISSN: 0255-5476
Volume: 514-516, Número: PART 2, Páginas: 1161-1165 (5)
Conference
3Rd International Materials Symposium/12Th Meeting of the Sociedad-Portuguesa-Da-Materials (Materials 2005/Spm), Date: MAR 20-23, 2005, Location: Aveiro, PORTUGAL, Patrocinadores: Portuguese Mat Soc, Mat Network Atlantic Arc, CiCECO, BPI, Bayer Mat Sci, DURIT, IZASA, GIC, Novagres, Rauschert, CRIOLAB CRYOGENICS Vacuum Syst Vacuum Chambers, FCT, NTI EUROPE, Fdn Calouste Gulbenkian, ScienTec, ThermoLab, Papelave, cienciapt net, Air Liquide, Host: Univ Aveiro
Indexing
Wos®
Scopus®
Publication Identifiers
SCOPUS: 2-s2.0-34547703857
Wos: WOS:000238056400231
Source Identifiers
ISSN: 0255-5476
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