Effect of Nitrogen Gas Flow on Amorphous Si-C-N Films Produced by Pvd Techniques

AuthID
P-000-FFN
7
Author(s)
Orfao, H
·
Pischow, K
·
De Rijk, J
·
Rybinski, M
·
Mrzyk, D
Tipo de Documento
Article
Year published
2003
Publicado
in SURFACE & COATINGS TECHNOLOGY, ISSN: 0257-8972
Volume: 174, Páginas: 324-330 (7)
Conference
8Th International Conference on Plasma Surface Engineering, Date: SEP 09-13, 2002, Location: GARMISCH PARTENKI, GERMANY
Indexing
Publication Identifiers
SCOPUS: 2-s2.0-0042357263
Wos: WOS:000185680300056
Source Identifiers
ISSN: 0257-8972
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