Large Area Deposition of Polymorphous Silicon by Plasma Enhanced Chemical Vapor Deposition at 27.12 Mhz and 13.56 Mhz

AuthID
 P-000-FQB
8
Author(s)
Guimaraes, L
·
Tipo de Documento
Article
Year published
2003
Publicado
in JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, ISSN: 0021-4922
Volume: 42, Número: 8, Páginas: 4935-4942 (8)
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Publication Identifiers
SCOPUS: 2-s2.0-0142023804
Wos: WOS:000185422900007
Source Identifiers
ISSN: 0021-4922
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