Influence of Metal Induced Crystallization Parameters on the Performance of Polycrystalline Silicon Thin Film Transistors

AuthID
P-000-1RW
1
Editor(es)
Nickel N.Werner J.Strunkk H.P.
Tipo de Documento
Article
Year published
2005
Publicado
in THIN SOLID FILMS, ISSN: 0040-6090
Volume: 487, Número: 1-2, Páginas: 102-106 (5)
Conference
8Th International Conference on Polycrystalline Semiconductors, Date: SEP 05-10, 2004, Location: Potsdam, GERMANY
Indexing
Publication Identifiers
SCOPUS: 2-s2.0-22944482823
Wos: WOS:000231209900022
Source Identifiers
ISSN: 0040-6090
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