Hot-Wire Plasma Assisted Chemical Vapor Deposition: A Deposition Technique to Obtain Silicon Thin Films

AuthID
 P-000-QF8
4
Author(s)
Tipo de Documento
Article
Year published
2002
Publicado
in JOURNAL OF APPLIED PHYSICS, ISSN: 0021-8979
Volume: 91, Número: 3, Páginas: 1644-1649 (6)
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Publication Identifiers
SCOPUS: 2-s2.0-0036469595
Wos: WOS:000173418500115
Source Identifiers
ISSN: 0021-8979
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