Amorphous and Microcrystalline Silicon Deposited by Hot-Wire Chemical Vapor Deposition at Low Substrate Temperatures: Application to Devices and Thin-Film Microelectromechanical Systems

AuthID
 P-000-TAE
5
Author(s)
Boucinha, M
·
1
Editor(es)
Mahan A.H.Schropp E.I.Conde J.P.Matsumur H.
Tipo de Documento
Article
Year published
2001
Publicado
in THIN SOLID FILMS, ISSN: 0040-6090
Volume: 395, Número: 1-2, Páginas: 105-111 (7)
Conference
1St International Conference on Cat-Cvd (Hot Wire Cvd) Process, Date: NOV 14-17, 2000, Location: KANAZAWA, JAPAN
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Publication Identifiers
SCOPUS: 2-s2.0-0035800980
Wos: WOS:000171625000022
Source Identifiers
ISSN: 0040-6090
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